Twin Carrier Heads
The provision of twin ultra-light, chemically resistant aluminium carrier heads allows for flexible system configurations:
- Double capacity/throughput (up to 2 x 8 " wafers)
- A/B material testing to compare different wafers using a given process
- Run two processes simultaneously
- Utilise a conditioner and processing head together to increase process performance
Automatic Plate Conditioning
The Tribo is supplied with an industry standard diamond conditioner. It fits on the 2nd carrier and is motor driven, allowing pad conditioning to be carried out.
Parameters that can be controlled include sweep, amplitude and download pressure
Minimise System Downtime
Up to four slurry pumps can be utilised, switched on and off independently and set at different rates from 20mls/min to 200mls/min.
This can effectively be used to increase the slurry capacity or use different slurries for different processing requirements.
Easy Operation
Ultra-light components such as the chemical resistant, aluminium platen and carrier heads have been implemented to ensure the system can be fully operated by only one person. Additionally, it is narrow enough to fit through a standard doorway - enabling movement between laboratories.
Co-efficient of Friction Monitoring
The ability to measure the CoF value is an integral part of the determination of 'break through' of different layers in patterned wafers or in the evaluation of a stable set of process conditions necessary for a highly controlled CMP process.
A secondary function is to monitor pad wear, slurry changes or conditioning changes.
Advanced Sensor Array
Multiple sensors have been installed in order to provide the operator with as much data as possible concerning the processing environment.
Data captured includes pad temperature, slurry(s) temperature, plate temperature, carrier/pad interface temperature and pad wear.
Intuitive User Interface
Unlike other CMP systems that incorporate built-in control panels, the Tribo CMP system utilises a laptop PC based graphical user interface allowing for real time graphing of system parameters.
Data Export
Via the the user interface, all monitored parameters can be stored and exported to various software formats in order to analyse the data in order to identify patterns, trends and catalogue historical process information.
For more information on the Orbis Chemical Mechanical Polishing system, call us on +44 (0)1389 875444 or complete our contact form.